Semiconductor film composition, manufacturing method of semiconductor film composition, manufacturing method of semiconductor member, manufacturing method of semiconductor processing material and semiconductor device

摘要

Compound (A) having a cationic functional group containing at least one of a primary nitrogen atom and a secondary nitrogen atom, and having a weight average molecular weight of 10,000 to 400,000 or less, and a -C (= 0) OX group (X A hydrogen atom or an alkyl group having 1 to 6 carbon atoms), and at least one of 6 or more is a -C (= 0) OH group among three or more -C (= 0) OX groups, and a weight average A crosslinking agent (B) having a molecular weight of 200 or more and 600 or less and water (D), wherein the compound (A) is an aliphatic amine, a composition for producing a film for a semiconductor device.