Reduce line edge roughness by changing step size

摘要

An image correction application is disclosed regarding the ability to apply maskless lithographic patterns to a substrate in a manufacturing process. Embodiments described herein relate to a software application platform that corrects non-uniform image patterns on a substrate. The application platform method comprises disabling at least one entire column of mirrors in a DMD, wherein the DMD has a plurality of columns and each column has a plurality of mirrors, a first portion of the substrate is subjected to electromagnetic radiation. Exposing to a shot, exposing a second portion of the substrate to a second shot of electromagnetic radiation, and repeating exposing the second portion of the substrate to a second shot until the substrate is completely processed. It includes.