Illumination optics for EUV projection lithography

摘要

Illumination optics (28) for EUV projection lithography are used to illuminate an object field (19) with illumination light (3). A first facet mirror (6) with a plurality of first facets is arranged on a mirror support in the beam path of the illuminating light (3). Downstream of the first facet mirror (6) in the beam path of the illuminating light (3) is a second facet mirror (10) with a plurality of second facets, which lie on a second mirror carrier around a facet arrangement center. Partial bundles of the illuminating light (3) are guided in the object field (19) overlapping each other via illumination channels, one of the first facets and one of the second facets belonging to each of the illumination channels. At least one illuminating light trap section is arranged in the illuminating light beam path after the second facet mirror (10). The result is a lighting optic in which interference light suppression is possible without undesirable thermal or optical effects.