Novel condenser for EUV lithography ring-field projection optics

机译：<标题> EUV光刻环形投影光学元件的新型冷凝器

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Henry N. Chapman; Keith A. Nugent;
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年度 1999
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专利

1. EUV LITHOGRAPHY: High-NA EUV optics are on their way [J] . John Wallace Laser Focus World: The Magazine for the Photonics & Optoelectronics Industry . 2013,第7期

机译：EUV光刻：高NA EUV光学器件正在发展中
2. Theoretical efficiency analysis of a condenser-embedded grating-based spectral purity filter for EUV lithography [J] . Naulleau PP., Sweatt WC., Tichenor DA. Optics Communications: A Journal Devoted to the Rapid Publication of Short Contributions in the Field of Optics and Interaction of Light with Matter . 2002,第1a6期

机译：一种基于聚光镜的光栅嵌入式光谱纯度滤光片的理论效率分析
3. MID-INFRARED OPTICS: CVD diamond IR optics enable EUV lithography [J] . ANDREW BENNETT, EUGENE ANOIKIN, BENNO VROLIJK Laser Focus World: The Magazine for the Photonics & Optoelectronics Industry . 2013,第11期

机译：中红外光学元件：CVD金刚石红外光学元件可实现EUV光刻
4. Novel condenser for EUV lithography ring-field projection optics [C] . Henry N. Chapman, Lawrence Livermore National Lab., Livermore, EUV, X-Ray, and Neutron Optics and Sources . 1999

机译：用于EUV光刻环形场投影光学器件的新型聚光镜
5. Gibbsian segregating alloys driven by thermal and concentration gradients: A potential grazing collector optics used in EUV lithography. [D] . Qiu, Huatan. 2007

机译：由温度和浓度梯度驱动的吉布斯偏析合金：EUV光刻中潜在的掠射收集器光学器件。
6. High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results [O] . Theodore Manouras, Panagiotis Argitis 2020

机译：高敏感性抗蚀性对EUV光刻进行抗衡性：材料设计策略和绩效结果综述
7. Fabrication and testing of optics for EUV projection lithography [O] . John S. Taylor, Gary E. Sommargren, Donald W. Sweeney, 1998

机译：EUV投影光刻光学的制造和测试
8. Novel condenser for EUV lithography ring-field projection optics [R] . Chapman, H., Nugent, K. A. 1999

机译：用于EUV光刻环场投影光学系统的新型聚光器

Novel condenser for EUV lithography ring-field projection optics

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