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Gibbsian segregating alloys driven by thermal and concentration gradients: A potential grazing collector optics used in EUV lithography.

机译:由温度和浓度梯度驱动的吉布斯偏析合金:EUV光刻中潜在的掠射收集器光学器件。

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摘要

A critical issue for EUV lithography is the minimization of collector degradation from intense plasma erosion and debris deposition. Reflectivity and lifetime of the collector optics will be heavily dependent on surface chemistry interactions between fuels and various mirror materials, in addition to high-energy ion and neutral particle erosion effects. An innovative Gibbsian segregation (GS) concept has been developed for being a self-healing, erosion-resistant collector optics. A Mo-Au GS alloy is developed on silicon using a DC dual-magnetron co-sputtering system in order for enhanced surface roughness properties, erosion resistance, and self-healing characteristics to maintain reflectivity over a longer period of mirror lifetime. A thin Au segregating layer will be maintained through segregation during exposure, even though overall erosion is taking place. The reflective material, Mo, underneath the segregating layer will be protected by this sacrificial layer which is lost due to preferential sputtering. The two dominant driving forces, thermal (temperature) and surface concentration gradient (surface removal flux), are the focus of this work. Both theoretical and experimental efforts have been performed to prove the effectiveness of the GS alloy used as EUV collection optics, and to elucidate the underlying physics behind it. The segregation diffusion, surface balance, erosion, and in-situ reflectivity will be investigated both qualitatively and quantitatively. Results show strong enhancement effect of temperature on GS performance, while only a weak effect of surface removal rate on GS performance. When equilibrium between GS and erosion is reached, the surface smoothness could be self-healed and reflectivity could be maintained at an equilibrium level, instead of continuously dropping down to an unacceptable level as conventional optic mirrors behave. GS process also shows good erosion resistance. The effectiveness of GS alloy as EUV mirror is dependent on the temperature and surface removal rate. The Mo-Au GS alloy could be effective at elevated temperature as the potential grazing mirror as EUV collector optics.
机译:EUV光刻的一个关键问题是最大程度地减少强烈的等离子体腐蚀和碎屑沉积引起的集电极退化。除高能离子和中性粒子腐蚀作用外,收集器光学器件的反射率和寿命将在很大程度上取决于燃料与各种镜面材料之间的表面化学相互作用。已经开发出一种创新的吉布斯偏析(GS)概念,使其成为一种自愈,抗腐蚀的集光光学器件。使用直流双磁控共溅射系统在硅上开发了Mo-Au GS合金,以提高表面粗糙度,抗侵蚀性和自愈特性,从而在较长的镜寿命内保持反射率。即使发生整体腐蚀,通过曝光过程中的偏析也会保持较薄的Au偏析层。在隔离层下面的反射材料Mo将被该牺牲层保护,该牺牲层由于优先溅射而损失。这项工作的重点是两个主要驱动力,即热(温度)和表面浓度梯度(表面去除通量)。已经进行了理论和实验上的努力以证明用作EUV收集光学器件的GS合金的有效性,并阐明其背后的基本物理原理。将定性和定量地研究偏析扩散,表面平衡,侵蚀和原位反射率。结果表明温度对GS性能的增强作用强,而表面去除率对GS性能的影响则微弱。当达到GS和侵蚀之间的平衡时,表面光滑度可以自我修复,反射率可以保持在平衡水平,而不是像传统的光学镜那样连续下降到不可接受的水平。 GS工艺也显示出良好的抗腐蚀性能。 GS合金作为EUV反射镜的有效性取决于温度和表面去除率。 Mo-Au GS合金在高温下可以作为EUV收集器光学元件的潜在掠射镜使用。

著录项

  • 作者

    Qiu, Huatan.;

  • 作者单位

    University of Illinois at Urbana-Champaign.;

  • 授予单位 University of Illinois at Urbana-Champaign.;
  • 学科 Physics Fluid and Plasma.; Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2007
  • 页码 192 p.
  • 总页数 192
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 等离子体物理学;工程材料学;
  • 关键词

  • 入库时间 2022-08-17 11:39:04

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