Substrate processing apparatus and substrate processing method

摘要

A substrate processing apparatus (1) that processes a substrate (S) by means of particles has a transport mechanism (CMA) which is configured to transport the substrate (S) along a transport surface (CS), a particle source (T), which configured to emit particles, a rotating mechanism (RTM) configured to pivot the particle source (T) about an axis of rotation, and a moving mechanism (RVM) configured to rotate the particle source (T) moved such that a distance between the particle source (T) and the transport surface (CS) is changed.