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Self-aligned gate end-cover (SAGE) architecture with gate contacts

机译:具有栅极触点的自对准栅极端盖(SAGE)架构

摘要

Self-aligned gate end cover (SAGE) architectures with gate contacts, and methods of fabricating SAGE architectures with gate contacts are described. In one example, an integrated circuit structure includes a gate structure over a semiconductor fin. A gate end cap isolation structure is laterally adjacent and in contact with the gate structure. A trench contact structure is over the semiconductor fin, with the gate end cap isolation structure laterally adjacent to and in contact with the trench contact structure. A local gate-to-contact connection that electrically connects the gate structure to the trench-contact structure.
机译:描述了具有栅极触点的自对准栅极端盖(SAGE)架构,以及制造具有栅极触点的SAGE架构的方法。在一示例中,集成电路结构包括在半导体鳍上方的栅极结构。栅极端盖隔离结构在横向上邻近于该栅极结构并与其接触。沟槽接触结构在半导体鳍上方,并且栅极端盖隔离结构在横向上与沟槽接触结构相邻并接触。将栅极结构电连接到沟槽接触结构的局部栅极至接触连接。

著录项

  • 公开/公告号DE102020102933A1

    专利类型

  • 公开/公告日2020-09-10

    原文格式PDF

  • 申请/专利权人 INTEL CORPORATION;

    申请/专利号DE202010102933

  • 发明设计人 WALID M. HAFEZ;SAIRAM SUBRAMANIAN;

    申请日2020-02-05

  • 分类号H01L27/088;H01L23/535;

  • 国家 DE

  • 入库时间 2022-08-21 11:01:07

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