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Ferroelectric-based field-effect transistor with threshold voltage switching for enhanced on-state and off-state performance

摘要

Techniques are disclosed herein for ferroelectric-based field-effect transistors (FETs) with threshold voltage (VT) switching for enhanced RF switch transistor on-state and off-state performance. Employing a ferroelectric gate dielectric layer that can switch between two ferroelectric states enables a higher VT during the transistor off-state (VT,hi) and a lower VT during the transistor on-state (VT,lo). Accordingly, the transistor on-state resistance (Ron) can be maintained low due to the available relatively high gate overdrive (Vg,on−VT,lo) while still handling a relatively high maximum RF power in the transistor off-state due to the high VT,hi−Vg,off value. Thus, the Ron of an RF switch transistor can be improved without sacrificing maximum RF power, and/or vice versa, the maximum RF power can be improved without sacrificing the Ron. A ferroelectric layer (e.g., including Hf

著录项

  • 公开/公告号US10720505B2

    专利类型

  • 公开/公告日2020.07.21

    原文格式PDF

  • 申请/专利权人

    申请/专利号US16080822

  • 申请日2016.04.01

  • 分类号

  • 国家 US

  • 入库时间 2022-08-21 10:59:34

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