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MoS2: a Choice Substrate for Accessing and Tuning the Electronic Properties of Graphene

机译:mos2:用于访问和调整电子设备的选择基板   石墨烯的性质

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摘要

One of the enduring challenges in graphene research and applications is theextreme sensitivity of its charge carriers to external perturbations,especially those introduced by the substrate. The best available substrates todate, graphite and hBN, still pose limitations: graphite being metallic doesnot allow gating, while both hBN and graphite having lattice structures closelymatched to that of graphene, may cause significant band structurereconstruction. Here we show that the atomically smooth surface of exfoliatedMoS2 provides access to the intrinsic electronic structure of graphene withoutthese drawbacks. Using scanning tunneling microscopy and Landau-levelspectroscopy in a device configuration which allows tuning the carrierconcentration, we find that graphene on MoS2 is ultra-flat producing long meanfree paths, while avoiding band structure reconstruction. Importantly, thescreening of the MoS2 substrate can be tuned by changing the position of theFermi energy with relatively low gate voltages. We show that shifting the Fermienergy from the gap to the edge of the conduction band gives rise to enhancedscreening and to a substantial increase in the mean-free-path and quasiparticlelifetime. MoS2 substrates thus provide unique opportunities to access theintrinsic electronic properties of graphene and to study in situ the effects ofscreening on electron-electron interactions and transport.
机译:石墨烯研究和应用中的持久挑战之一是其载流子对外部扰动(特别是由基底引入的扰动)的极高灵敏度。迄今为止,最好的可用衬底,石墨和hBN仍然存在局限性:石墨是金属不允许门控,而hBN和具有与石墨烯紧密匹配的晶格结构的石墨都可能导致明显的能带结构重建。在这里,我们表明,脱落的MoS2的原子光滑表面可提供对石墨烯固有电子结构的访问,而没有这些缺点。在允许调整载流子浓度的设备配置中使用扫描隧道显微镜和Landau级光谱,我们发现MoS2上的石墨烯超平坦,产生长的平均自由程,同时避免了能带结构的重建。重要的是,可以通过以相对较低的栅极电压改变费米能量的位置来调整MoS 2衬底的屏蔽。我们表明,将费米能从间隙移到导带的边缘会提高屏蔽效果,并显着增加平均自由程和准粒子寿命。因此,MoS2衬底为获得石墨烯的本征电子特性和就地研究屏蔽对电子-电子相互作用和传输的影响提供了独特的机会。

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