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Tuning the electronic properties and Schottky barrier height of the vertical graphene/MoS2 heterostructure by an electric gating

机译:通过电门控调整垂直石墨烯/ MoS2异质结构的电子特性和肖特基势垒高度

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In this paper, the electronic properties and Schottky contact in graphene/MoS2(G/MoS2) heterostructure under an applied electric field are investigated by means of the density functional theory. It can be seen that the electronic properties of the G/MoS2heterostructure are preserved upon contacting owing to the weak van der Waals interaction. We found that then-type Schottky contact is formed in the G/MoS2heterostructure with the Schottky barrier height of 0.49 eV. Furthermore, both Schottky contact and Schottky barrier height in the G/MoS2heterostructure could be controlled by the applied electric field. If a positive electric field of 4 Vm is applied to the system, a transformation from then-type Schottky contact to thep-type one was observed, whereas the system keeps ann-type Schottky contact when a negative electric field is applied. Our results may provide helpful information to design, fabricate, and understand the physics mechanism in the graphene-based two-dimensional van der Waals heterostructures like as G/MoS2heterostructure.
机译:本文利用密度泛函理论研究了石墨烯/ MoS2(G / MoS2)异质结构在电场作用下的电子性质和肖特基接触。可以看出,由于弱的范德华相互作用,G / MoS 2异质结构的电子性质在接触时得以保留。我们发现在G / MoS2异质结构中形成了肖特基接触,肖特基势垒高度为0.49 eV。此外,G / MoS 2异质结构中的肖特基接触和肖特基势垒高度都可以通过施加的电场来控制。如果向系统施加4 / V / nm的正电场,则观察到从那么型肖特基接触到p型接触的转变,而当施加负电场时,系统保持n型肖特基接触。我们的结果可能为设计,制造和理解基于石墨烯的二维范德华异质结构(例如G / MoS2异质结构)中的物理机理提供有用的信息。

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