首页> 外文OA文献 >Controlled Electrodeposition of Gold Nanoparticles onto Copper-Supported Few-Layer Graphene in Non-Aqueous Conditions
【2h】

Controlled Electrodeposition of Gold Nanoparticles onto Copper-Supported Few-Layer Graphene in Non-Aqueous Conditions

机译:非水条件下金纳米粒子在铜负载的少量层石墨烯上的可控电沉积

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

Graphene-Au hybrid materials show promise for applications ranging from biosensing to field emission devices. Electrodeposition is an inexpensive, fast and technically simple method for controlled deposition of nanoparticles but its use with graphene prepared by chemical vapor deposition (CVD) presents some problems. Cu foil is commonly used to catalyze the CVD process and the resulting graphene is most con-veniently handled while retained on the Cu support. However Cu is able to spontane-ously reduce Au salts in aqueous solution and hence deposition of nanoparticles via galvanic displacement occurs simultaneously with electrodeposition, and control of the growth process is lost. We show here that Au nanoparticles can be controllably electrodeposited onto Cu-supported few layer graphene (FLG) from N,N-dimethylformamide (DMF) solutions of a [AuCl4]- salt because spontaneous deposi-tion of Au nanoparticles does not occur in this medium. Deposition occurs by the in-stantaneous nucleation mechanism when driven by an applied potential enabling the Au nanoparticle density to be controlled by the deposition conditions, predominantly the deposition potential. Following nucleation, nanoparticle growth is diffusion con-trolled. Our results demonstrate that the growth rate is similar in the presence and ab-sence of an applied potential and control of growth time is key to controlling nanopar-ticle size.
机译:石墨烯-金杂化材料显示出从生物传感到场发射器件的应用前景。电沉积是用于控制纳米颗粒沉积的廉价,快速且技术上简单的方法,但是将其与通过化学气相沉积(CVD)制备的石墨烯一起使用时会遇到一些问题。铜箔通常用于催化CVD工艺,生成的石墨烯最方便地处理,同时保留在铜载体上。但是,Cu能够自发地还原水溶液中的Au盐,因此在电沉积的同时会发生通过电位移的纳米颗粒沉积,并且失去了对生长过程的控制。我们在这里表明,可以从[AuCl4]-盐的N,N-二甲基甲酰胺(DMF)溶液中将Au纳米粒子可控地电沉积到Cu支撑的几层石墨烯(FLG)上,因为在这种情况下不会发生Au纳米粒子的自发沉积介质。当由施加的电势驱动时,沉积会通过瞬时成核机制发生,从而使Au纳米粒子的密度受沉积条件(主要是沉积电势)控制。成核后,纳米颗粒的生长被扩散控制。我们的结果表明,在存在和不存在施加电势的情况下,增长率均相似,并且控制生长时间是控制纳米粒子尺寸的关键。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号