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The effect of annealing temperature on gold catalyst and substrate surface in the growth of gaAs nanowire

机译:退火温度对GaAs纳米线生长中金催化剂和衬底表面的影响

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摘要

Annealing temperature plays an important role in the formation of Au-Ga alloy eutectic. Effect of annealing temperature on gold catalyst and substrate surface were studied using AFM, FE-SEM and TEM. With a temperature of 600°C, the layer of gold colloids particle formed an islands in the state of molten eutectic alloy and absorbed evaporated metal-organics to formed nanowire underneath the alloy. Pit formed on the substrate surface due to the chemical reactions during the pre-annealing process have an impact on the direction of nanowire growth Without pre-annealing temperature, the nanowire formed vertically on the GaAs (100) surface, meanwhile the growth direction depends on the intact nucleation facets and surface energy, when annealing is applied. With pre-annealing temperature, the wire base is large and curve due to the migration of Ga atoms on the substrate surface towards the tip of the wire and line tension between the substrate surface and gold particle.
机译:退火温度在Au-Ga合金共晶形成中起重要作用。利用AFM,FE-SEM和TEM研究了退火温度对金催化剂和基体表面的影响。在600℃的温度下,金胶体颗粒层在熔融共晶合金状态下形成岛状物,并吸收蒸发的金属有机物以在合金下方形成纳米线。由于预退火过程中的化学反应而在基板表面形成的凹坑会影响纳米线的生长方向。没有预退火温度,纳米线会垂直形成在GaAs(100)表面上,而生长方向取决于当进行退火时,完整的成核面和表面能。在预退火温度下,由于基体表面上的Ga原子朝向线的尖端迁移以及基体表面与金颗粒之间的线张力,线基变大且弯曲。

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