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The atomic and spin-electronic structure of interfaces and extended structural defects in the Co-based full Heusler alloys

机译:Co基全Heusler合金中界面的原子和自旋电子结构以及扩展的结构缺陷

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摘要

The atomic and spin-electronic structure of interfaces and extended structural defects in the Co-based full Heusler alloys is studied. Interfaces between a half-metallic Heusler alloy and metal or semiconductor are fundamental and determine the performance of spintronic devices such as spin valves or devices for spin injection applications. It is shown that for the Co2MnSi/Ag bulk-like terminated interfaces, the interfacial spin-polarisation significantly depends on the atomic plane termination. In addition, on the example of experimentally realised interface, part of a spin valve, it is demonstrated that there is an additional monolayer at the interface, which as shown by the density functional theory calculations can create significantly negative local spin-polarisation, detrimental for the device performance. It is demonstrated that the interfaces between the Heusler alloy and Si, suffer from large interfacial interdiffusion which leads to a gradual decrease of magnetic moment over 2-3 nm region in which the spin-polarisation is also significantly affected. It is shown that even sharp interfaces are not desirable since they lead to reversed spin-polarisation. However, it is demonstrated that the addition of thermodynamically stable Si-Co-Si monolayer provides very high spin-polarisation across all interface layers. An ideal candidate for spin injection applications is found to be the Co2FeAl0.5Si0.5/Ge interface which shows very minor and atomic plane selective interdiffusion that does not affect film’s half-metallic properties, absence of formation of any secondary phases and almost no interfacial strain. Based on models derived from electron microscopy observations, it is demonstrated that this interface retains very high interfacial spin-polarisation. Finally, the atomic structure of an extended structural defect observed in Co2FeAl0.5Si0.5 thin film is revealed by electron microscopy. The performed density functional theory modelling shows that these boundaries reverse the sign of spin-polarisation, hence their presence has to be minimised in order to achieve films with better properties.
机译:研究了钴基全Heusler合金中界面的原子和自旋电子结构以及扩展的结构缺陷。半金属Heusler合金与金属或半导体之间的界面是基本的,并决定了自旋电子设备(例如自旋阀或自旋注入应用设备)的性能。结果表明,对于Co2MnSi / Ag块状终止界面,界面自旋极化明显取决于原子平面终止。此外,在实验实现的界面(自旋阀的一部分)的示例中,证明了在界面处还有一个附加的单层,如密度泛函理论计算所示,这会产生明显的负局部自旋极化,这对设备性能。结果表明,Heusler合金与Si之间的界面会发生较大的界面相互扩散,从而导致磁矩在2-3 nm区域逐渐减小,在该区域中自旋极化也受到显着影响。结果表明,甚至尖锐的界面也是不理想的,因为它们会导致自旋极化反转。但是,已证明添加热力学稳定的Si-Co-Si单层可在所有界面层上提供非常高的自旋极化。发现用于自旋注入应用的理想候选材料是Co2FeAl0.5Si0.5 / Ge界面,该界面显示出极小的原子平面选择性互扩散,不会影响薄膜的半金属性能,不形成任何第二相并且几乎没有界面应变。基于源自电子显微镜观察的模型,证明该界面保留了非常高的界面自旋极化。最后,通过电子显微镜揭示了在Co2FeAl0.5Si0.5薄膜中观察到的扩展结构缺陷的原子结构。进行的密度泛函理论建模表明,这些边界使自旋极化的符号反转,因此必须最小化它们的存在才能获得具有更好性能的薄膜。

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    Nedelkoski Zlatko;

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