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Atomic-scale characterization of interfaces and defects in electronic heterostructures.

机译:电子异质结构中界面和缺陷的原子尺度表征。

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摘要

The significant advances in epitaxial thin film growth techniques have fostered wide applications of heterostructured systems in microelectronics. However, the defects formed at the interfaces of heterostructures or in the films can severely affect the properties and performance of the designed microelectronic devices. Microstructural characterizations of defects and interfaces have always been a subject of great scientific interest for understanding and improving the physical properties of devices. Among various microstructural characterization methods, scanning transmission electron microscopy (STEM) is well known to possess the ability to form a high angle annular dark field (HAADF) Z-contrast image, in which intensity is proportional to the square of the mean atomic number of the probed volume and is directly interpretable. Moreover, the instrumental and technique development in the STEM field has fostered the conjunction of electron energy loss spectroscopy (EELS) and Z-contrast imaging and their widespread use for nearly atomic level chemical analysis at interfaces and isolated defects. In this thesis, I discuss the practical aspects of the experimental STEM techniques and demonstrate the application of these techniques to the study of interfaces and defects in multiple heterostructured systems: ferroelectric PbTiO3-Pt electrode, superconductor YBCO-SrTiO3, diluted magnetic semiconductor Co:TiO2-LaAlO3, and II-VI semiconductor HgTe-CdTe superlattices.; Valuable experimental results have been acquired on these heterostructured systems. For example, an amorphous Ti-rich interfacial layer containing nano-scale precipitates was identified on the PbTiO3-Pt interface, which provides direct experimental evidence to support the recently proposed passive layer model for degradation mechanisms in ferroelectrics. We first observed the coexistence of 124 and 125 YBCO defect phases in YBCO thin films prepared by pulsed laser depositions. Crystallographic shear defect structures were first observed in the anatase (3%Co)-TiO2 thin film. Strikingly, annealing experiments of HgTe-CdTe superlattices for 12 hrs at 140°C and 185°C appear to sharpen the HgTe-CdTe interfaces rather than blurring them. The corresponding tentative models and mechanisms are built to explain these phenomena. This thesis highlighted that successful characterization and analysis based on interfaces and defects in advanced materials would provide the basis for predictive material design with more desirable physical properties and higher performance.
机译:外延薄膜生长技术的重大进步促进了异质结构系统在微电子领域的广泛应用。但是,在异质结构的界面或薄膜中形成的缺陷会严重影响所设计的微电子器件的性能和性能。缺陷和界面的微观结构表征一直是人们对理解和改善器件物理性能的重要科学兴趣。在各种微结构表征方法中,众所周知,扫描透射电子显微镜(STEM)具有形成高角度环形暗场(HAADF)Z对比图像的能力,其中强度与碳原子平均原子数的平方成正比。探测的体积,并且可以直接解释。此外,STEM领域的仪器和技术发展促进了电子能量损失谱(EELS)和Z对比成像的结合,并将其广泛用于界面和孤立缺陷的近原子级化学分析。在本文中,我将讨论实验性STEM技术的实践方面,并论证这些技术在研究多个异质结构系统中的界面和缺陷方面的应用:铁电PbTiO3-Pt电极,超导体YBCO-SrTiO3,稀磁半导体Co:TiO2 -LaAlO3和II-VI半导体HgTe-CdTe超晶格。在这些异结构系统上获得了宝贵的实验结果。例如,在PbTiO3-Pt界面上发现了含有纳米级沉淀物的非晶态富钛界面层,这提供了直接的实验证据来支持最近提出的用于铁电体降解机理的无源层模型。我们首先观察到通过脉冲激光沉积制备的YBCO薄膜中124和125 YBCO缺陷相的共存。首先在锐钛矿(3%Co)-TiO2薄膜中观察到晶体学剪切缺陷结构。令人惊讶的是,HgTe-CdTe超晶格在140°C和185°C下退火12小时的实验似乎使HgTe-CdTe界面变尖锐而不是使它们模糊。建立了相应的试验模型和机制来解释这些现象。本文着重指出,基于先进材料界面和缺陷的成功表征和分析将为具有更理想物理性能和更高性能的预测材料设计提供基础。

著录项

  • 作者

    Fu, Lianfeng.;

  • 作者单位

    University of California, Davis.;

  • 授予单位 University of California, Davis.;
  • 学科 Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2006
  • 页码 179 p.
  • 总页数 179
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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