N-doped monoclinic Ga2O3 nanostructures of different morphologies have been synthesized by heating Ga metal in ambient air at 1150 degrees C to 1350 degrees C for 1 to 5 h duration. Neither catalyst nor any gas flow has been used for the synthesis of N-doped Ga2O3 nanostructures. The morphology was controlled by monitoring the curvature of the Ga droplet. Plausible growth mechanisms are discussed to explain the different morphology of the nanostructures. Elemental mapping by electron energy loss spectroscopy of the nanostructures indicate uniform distribution of Ga, O and N. It is interesting to note that we have used neither nitride source nor any gas flow but the synthesis was carried out in ambient air. We believe that ambient nitrogen acts as the source of nitrogen. Unintentional nitrogen doping of the Ga2O3 nanostructures is a straightforward method and such nanostructures could be promising candidates for white light emission.
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机译:通过将Ga金属在1150摄氏度至1350摄氏度的环境空气中加热1至5小时,可以合成出不同形态的N掺杂单斜Ga2O3纳米结构。既没有催化剂也没有任何气流用于合成N掺杂的Ga2O3纳米结构。通过监测Ga液滴的曲率来控制形态。讨论了合理的生长机理以解释纳米结构的不同形态。纳米结构通过电子能量损失谱的元素图谱表明Ga,O和N分布均匀。有趣的是,我们既未使用氮化物源也未使用任何气流,但合成是在环境空气中进行的。我们认为环境氮是氮的来源。 Ga 2 O 3纳米结构的无意氮掺杂是一种简单的方法,这种纳米结构可能是有希望的白光发射候选物。
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