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Effects of implanted nitrogen on the microstructural, optical, and magnetic properties of Mn-implanted GaN

机译:注入氮对锰注入GaN的微观结构,光学和磁性的影响

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摘要

The effects of implanted nitrogen on microstructural, magnetic, and optical properties of Mn-implanted GaN were studied. N and Mn ions were coimplanted into p-GaN and subsequently annealed at 973-1173 K. Compared with Mn-implanted samples, the Curie temperature and magnetic moment significantly increased. From high-resolution transmission electron microscopy, Mn nitrides such as Mn 6N2.58 and Mn3N2 drastically decreased, and the concentration of N vacancies was reduced by the N implantation. This led to the increase of Mn concentration occupying Ga lattice sites, evident by the shift of Raman mode (E2) at 567 cm-1 to higher energy by about 2.5 cm-1. The photoluminescence peak at 2.92 eV shifted to 2.86 eV and became strong with N implantation, indicating an increase in effective hole concentration increased due to an enhanced activation of Mn impurities in p-GaN. Consequently, the enhancement of ferromagnetic property by coimplantation of Mn and N ions originated from the increase of hole concentration via the increase of Mn concentration in GaN, due to the suppression of production of Mn-N compounds.
机译:研究了氮的注入对锰注入的GaN的微观结构,磁性和光学性质的影响。将N和Mn离子共注入p-GaN中,然后在973-1173 K退火。与Mn注入的样品相比,居里温度和磁矩显着增加。从高分辨率透射电子显微镜观察,Mn氮化物(如Mn 6N2.58和Mn3N2)急剧减少,并且通过注入N减少了N空位的浓度。这导致锰浓度增加而占据了Ga晶格位置,这可以通过在567 cm-1处的拉曼模式(E2)向约2.5 cm-1的较高能量移动来证明。在N注入下,在2.92 eV处的光致发光峰移至2.86 eV,并变强,表明有效空穴浓度的增加归因于p-GaN中Mn杂质增强的激活。因此,由于抑制了Mn-N化合物的产生,通过GaN中Mn浓度的增加而导致的空穴浓度的增加,是由于Mn和N离子的共注入而引起的铁磁性的提高。

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