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Pressure gradient and geometrical variation of the abrasive blocks during the polishing process of ceramic tiles with line contact

机译:线接触瓷砖抛光过程中磨料块的压力梯度和几何变化

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摘要

A series of experimental investigation has been carried out to develop and describe the distribution ofudpressure gradient underneath and across the topological surface of laboratory grinding tools. The surfaceudpressure plays a key role during polishing process of ceramic tiles in gloss gaining and development ofudsurface roughness. Analogous to the surface topography changes of the grinding tools and ceramic tiles, the wear of the work tools and work pieces are proportional to the grinding work that was performed between the surfaces during the polishing process. The present work intends to evaluate the influence of the gradual distribution of surface pressure in polishing ceramic tiles with line contact. For this purpose, two grinding tools were assembled together as a polishing head and installed on a CNC tribometer machine with a deflection angle of 2.2° from the base coordinate system of the machine. In this thesis, the theory of pressure distributed gradually underneath and across the polishing tools wasudsuccessfully defined by implementing a new polishing tool composed of rotating shaft with pivot joint, helicaludsprings and two abrasive blocks attached on it.udThese findings enhance the understanding of pressure distribution from previous study of polishing with flatudcontact using single abrasive block. With these comparisons the process outcome in terms of gloss level and fine surface finish could be further optimised. The effect of the material removal and gloss development dueudto polishing tools configuration with preferred process parameters were found to be minimised or maximised according to the kinematics chosen. Differences were clearly illustrated at the end of the work.
机译:已进行了一系列实验研究,以开发和描述实验室研磨工具的下方和整个拓扑表面的 ud压梯度的分布。表面超压在瓷砖抛光过程中对获得光泽和提高表面粗糙度起着关键作用。类似于研磨工具和瓷砖的表面形貌变化,工作工具和工件的磨损与在抛光过程中在表面之间进行的研磨工作成比例。本工作旨在评估在线接触抛光瓷砖中表面压力逐渐分布的影响。为此,将两个研磨工具组装在一起作为抛光头,并以距机器基本坐标系2.2°的偏转角安装在CNC摩擦计机器上。在本文中,通过实施一种新的抛光工具,成功地定义了压力在抛光工具下方和整个抛光工具上的分布,该抛光工具由旋转轴和枢轴接头,螺旋弹簧和两个附着在其上的磨料块组成。从以前使用单块磨料进行平面非接触式抛光的研究中了解压力分布。通过这些比较,可以进一步优化在光泽度和精细表面光洁度方面的工艺结果。根据所选择的运动学,发现由于具有优选工艺参数的抛光工具配置而导致的材料去除和光泽增加的影响被最小化或最大化。在工作结束时清楚地说明了差异。

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    Amiril Sahab Abdul Sani;

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  • 年度 2014
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