The modified 200 keV pulsed electron beam source for the VEPP-5 injection complex

摘要

The modified pulsed electron beam source on voltage 200 kV and current 10 A with half-height pulse durationud2.5 ns and repetition rate 50 Hz is described. The source gun has been performed on the base of impregnated cathodeudwith 20 mm diameter. The cathode pulse voltage is formed by storage capacitance discharge through IGBTudswitch and pulse transformer. The gun control unit located at the high voltage potential produces cathode heat voltageudand control grid voltage. The source test results are presented.