Nanocrystalline ZnO films were deposited on to glass substrates in the temperature range of 473–673Kusing pulsed spray pyrolysis. The structural, substructural, and optical properties of the films were investigated bymeans of X-ray diffraction analysis, Raman scattering, and Fourier transform infrared (FTIR) spectroscopy.udThe effect of the substrate temperature (Ts) on the coherent scattering domain (CSD) sizes L, microstrains e, andmicrostress s grades, and the average density of dislocations r in the films were estimated through the broadening of X-ray lines using the Cauchy and Gauss approximations and the threefold function convolution method. The ZnO films grown at Ts¼623–673K possessed the highest values of L, and the lowest of e, s, and r, indicating high-crystalline quality. The Raman spectra showed peaks located at 95–98, 333–336, 415, 439–442, 572, and 578– 584 cm 1, which were interpreted as E2 low(Zn), (E2 high E2 low), E1(TO), E2 high(O), A1(LO) and E1(LO) phonon modes of the ZnO wurtzite phase. The FTIR spectra showed relatively weak signals at 856, 1405, and 1560 cm 1, corresponding to the C–H and C–O stretching modes, in addition to the main Zn–O mode at 475cm 1, indicating a low content of precursor residues.
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机译：使用脉冲喷雾热解法在473–673K的温度范围内将纳米晶体ZnO薄膜沉积到玻璃基板上。通过X射线衍射分析，拉曼散射和傅立叶变换红外（FTIR）光谱研究了薄膜的结构，亚结构和光学性质。 ud衬底温度（Ts）对相干散射域（CSD）的影响膜的尺寸L，微应变e和微应力s等级以及薄膜中位错的平均密度r通过使用柯西和高斯近似和三重函数卷积方法加宽X射线线来估计。在Ts¼623–673K处生长的ZnO薄膜具有最高的L值，而最低的e，s和r则表明其结晶质量高。拉曼光谱显示峰位于95-98、333-336、415、439-442、572和578-584 cm 1，被解释为E2低（Zn），（E2高E2低），E1（TO ），ZnO纤锌矿相的E2高（O），A1（LO）和E1（LO）声子模。 FTIR光谱显示在856、1405和1560 cm 1处相对较弱的信号，对应于C–H和C–O拉伸模式，此外在475cm 1处具有主要的Zn–O模式，表明前体残留物含量低。
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