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Local order of Sb and Bi dopants in hydrogenated amorphous germanium thin films studied by extended x-ray absorption fine structure

机译:通过延长X射线吸收细结构研究了氢化非晶锗薄膜中的Sb和Bi掺杂剂的局部顺序

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摘要

This letter reports on the investigation of the local order and coordination of Sb and Bi impurities in hydrogenated amorphous germanium thin films. The study uses the extended x-ray absorption fine structure technique in fluorescence mode at room temperature. The investigation includes doping concentrations ranging from 1.1x10(19) to 5x10(20) cm(-3). For both impurities, the evidence is that the thermal equilibrium model is not applicable in this case. This result qualitatively follows the behavior of Ga and In impurities in hydrogenated amorphous germanium (a-Ge:H) samples except for Bi. These findings are consistent with data on the transport properties of Sb- and Bi-doped a-Ge:H films. (C) 2002 American Institute of Physics.
机译:这封信报告了氢化非晶锗薄膜中Sb和Bi杂质的局部秩序和协调的调查。该研究在室温下使用荧光模式的延伸X射线吸收细结构技术。该研究包括掺杂浓度,范围为1.1×10(19)至5×10(20)cm(-3)。对于杂质,证据表明,在这种情况下,热平衡模型不适用。该结果定性遵循除BI除外氢化非晶锗(A-GE:H)样品中的Ga和杂质的行为。这些发现与关于SB-和双掺杂A-GE:H薄膜的传输性质的数据一致。 (c)2002年美国物理研究所。

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