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Investigation of optical waveguides in lithium niobate produced by etching during the in-diffusion of titanium

机译:钛在内扩散过程中蚀刻产生的铌酸锂光波导的研究

摘要

A previous investigation, discovered a new technique to surface machine lithium niobate crystals, named as `Etching During the Indiffusion of Titanium' (EDIT). In this technique, an unprocessed `top' lithium niobate wafer, placed on top of a `bottom' Ti patterned lithium niobate wafer and annealed in a wet oxygen atmosphere, is etched corresponding to the Ti pattern on the `bottom' wafer. The resulting etched surfaces were found to be very smooth in nature. Furthermore, the bulk material properties are maintained under the etched region, with no trace of impurities. However, unexpectedly, it was observed that trenches fabricated by this technique appeared to support optical waveguiding. This thesis investigates the optical waveguiding effect observed under EDIT etched trenches. It is demonstrated that the region under an EDIT etched trench is indeed an optical waveguide and supports optical modes. The mode behaviour depends on the trench depth and polarisation of the light input. Evidence suggests that the optical waveguiding is due to a stress induced refractive index change, under an EDIT etched trench. Single mode waveguides at 633 nm wavelength are demonstrated on x, y and z-cut congruent lithium niobate and z-cut 5 mol% Mg-doped congruent lithium niobate. It is shown that in the EDIT technique, when the `bottom' wafer is maintained constant as x-cut congruent lithium niobate, a consistent etch depth is obtained irrespective of the crystal orientation of the lithium niobate `top' wafer. However, in the case of stoichiometric lithium niobate a significant reduction in the etch depth is observed, indicating that vacant lithium sites in the crystal lattice are of significance during the EDIT process. Evidence suggests that the observed waveguiding under EDIT etched trenches occurs due to a combination of a topography change and surface tension reshaping. This is evidenced by the observation of optical waveguiding under trenches produced using hydrofluoric acid etching and reshaping such trenches, by annealing them in the same environmental conditions of the EDIT process. When a lithium niobate crystal is annealed, the surface reshapes and smoothens to minimise surface energy. When cooled to room temperature, the smoothened surface is not in equilibrium with the underlying substrate. To obtain an energetically favourable condition there is induced stress between the reformed surface and the underlying substrate, thereby, causing an increase in the refractive index via the photo-elastic effect. The EDIT technique is used to fabricate single mode optical waveguides at 1550 nm wavelength in z-cut 5 mol% Mg-doped congruent lithium niobate. Furthermore, the electric field poling technique is applied to EDIT processed crystals to fabricate periodically domain inverted structures on EDIT etched trenches, which offers great potential for applications in nonlinear integrated optics. In summary, the region under the EDIT etched trench is an optical waveguide. It is proposed that the physical mechanism behind the formation of EDIT waveguides is a combination of change in surface topography and surface tension reshaping. The resulting waveguides are impurity free and maintain the bulk material properties. Such waveguides show promise for the development of nonlinear integrated optical devices.
机译:先前的研究发现了一种新的表面处理铌酸锂晶体的技术,称为“钛扩散过程中的蚀刻”(EDIT)。在该技术中,对应于“底部”晶片上的Ti图案,蚀刻未处理的“顶部”铌酸锂晶片,该晶片放置在“底部” Ti图案化的铌酸锂晶片的顶部并在湿氧气氛中退火。发现所得的蚀刻表面本质上非常光滑。此外,本体材料的性质保持在蚀刻区域下,没有任何杂质。然而,出乎意料的是,观察到通过该技术制造的沟槽似乎支持光波导。本文研究了在EDIT刻蚀沟槽下观察到的光波导效应。事实证明,EDIT蚀刻沟槽下方的区域确实是光波导,并支持光学模式。模式行为取决于沟槽深度和光输入的偏振。有证据表明,在EDIT蚀刻沟槽下,光波导是由于应力引起的折射率变化所致。在x,y和z切割的全铌酸锂和z切割的5摩尔%Mg掺杂的全铌酸锂上展示了633 nm波长的单模波导。结果表明,在EDIT技术中,当“底部”晶片作为x切面的全铌酸锂保持恒定时,无论铌酸锂“顶部”晶片的晶体取向如何,都能获得一致的蚀刻深度。然而,在化学计量的铌酸锂的情况下,观察到蚀刻深度的显着减小,这表明在EDIT过程中晶格中空置的锂位点很重要。证据表明,在EDIT蚀刻沟槽下观察到的波导是由于形貌变化和表面张力整形的结合而发生的。通过在使用EDIT的相同环境条件下对氢氟酸刻蚀产生的沟槽下进行光波导并对其进行整形(通过对它们进行退火)可以证明这一点。铌酸锂晶体退火后,表面会重新塑形和平滑化,以使表面能最小化。当冷却至室温时,平滑的表面与下面的基底不平衡。为了获得能量上有利的条件,在重整表面和下面的基板之间产生了感应应力,从而通过光弹性效应导致折射率增加。 EDIT技术用于在z切割的5 mol%的Mg掺杂全铌酸锂中制造1550 nm波长的单模光波导。此外,将电场极化技术应用于EDIT处理过的晶体,以在EDIT刻蚀的沟槽上周期性地制造畴反转结构,这为非线性集成光学中的应用提供了巨大潜力。总之,EDIT蚀刻沟槽下方的区域是光波导。提出了形成EDIT波导的物理机制是表面形貌变化和表面张力重塑的结合。所得的波导是无杂质的,并保持了块状材料的性能。这样的波导显示出开发非线性集成光学器件的希望。

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