Thermal and Electrical Interaction of Tantalum with a Low Temperature Chemically Active Plasma Flow

摘要

The paper deals with an experimental study of radiative heat transfer and charge transfer processes from the surface of tantalum plates under conditions of unsteady high-temperature heating and oxidation. It is shown that at plate temperatures of 1800 K, the heat flux may be as high as 400 kW/sq m. Heating is shown to stimulate the emissivity of tantalum and the temperature of the free electrons which surface, through a gas boundary layer, from the plasma onto the metal.