High resolution developing of photosensitive resists Patent

机译：高分辨率显影光敏抗蚀剂专利

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摘要

Composition and process for improving definition of resin masks used in chemical etching

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作者
Taylor, C. J.;
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年度 1969
页码 1-3
总页数 3
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
CHEMICAL REACTIONS; ETCHING; MASKING; ORGANIC COMPOUNDS; PHOTOSENSITIVITY; PRODUCT DEVELOPMENT;

机译：化学反应;蚀刻;掩蔽;有机化合物;光敏性;产品开发;

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专利

1. An Alkaline-Developable, Chemically Amplified, Negative-Type Photosensitive Poly(benzoxazole) Resist Based on Poly(o-hydroxy amide), an Active Ester-Type Cross-Linker, and a Photobase Generator [J] . Mizoguchi K, Higashihara T, Ueda M Macromolecules . 2009,第4期

机译：基于聚（邻羟基酰胺），活性酯型交联剂和光碱产生剂的碱性可显影，化学放大的负型光敏聚（苯并恶唑）抗蚀剂。
2. An Alkaline-Developable, Chemically Amplified, Negative-Type Photosensitive Poly(benzoxazole) Resist Based on Poly(o-hydroxy amide), an Active Ester-Type Cross-Linker, and a Photobase Generator [J] . Mizoguchi K, Higashihara T, Ueda M Macromolecules . 2009,第4期

机译：基于聚（邻羟基酰胺），活性酯型交联剂和光碱产生剂的碱性可显影，化学放大的负型光敏聚（苯并恶唑）抗蚀剂。
3. A positive-working photosensitive alkaline-developable polyimide with a highly dimensional stability and low dielectric constant based on poly(amic acid) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound [J] . Seino H., Haba O., Ueda M., Journal of Polymer Science, Part A. Polymer Chemistry . 1998,第13期

机译：基于聚酰胺酸作为聚酰亚胺前体和重氮萘醌作为光敏化合物的具有高尺寸稳定性和低介电常数的正型光敏碱性可显影聚酰亚胺
4. Develop an integrated patent quality matrix for investigating the competitive features among multiple competitive patent pools [C] . Wang Yu-Hui, Trappey Amy J.C., Liu Benjamin P., IEEE International Conference on computer supported cooperative work in design . 2014

机译：建立综合的专利质量矩阵，以调查多个竞争专利池中的竞争特征
5. Weak patents, open source patenting, and implications for the Bayh-Dole Act in developing countries. [D] . Boettiger, Sara deNoyelles. 2007

机译：弱专利，开放源专利以及对发展中国家的《 Bay-Dole法案》的影响。
6. Patent pledges, open IP, or patent pools? Developing taxonomies in the thicket of terminologies [O] . Jonas Fabian Ehrnsperger, Frank Tietze 2012

机译：专利承诺，开放式IP还是专利池？在术语丛中发展分类法
7. Positive-type Alkaline Developable Photosensitive Branched Polyamides with Low Degree of Branching and Diazonaphthoquinone as a Photosensitive Compound [O] . Jijun Xiao, Yosuke Inai, Li Li, 2006

机译：阳性型碱性显影光敏支化聚酰胺，具有低分支和重氮碱基作为光敏化合物

High resolution developing of photosensitive resists Patent

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