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Secondary characteristic fluorescence correction in the EPMA

机译：Epma中的二次特征荧光校正

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作者
Anderson, I. M. ; Bentley, J. ; Carter, C. B.;
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年度 1995
页码 1-7
总页数 7
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Electron Microprobe Analysis; Electron Probes; Fluorescence;

机译：电子探针分析;电子探针;荧光;

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专利

1. Secondary Fluorescence Correction for Characteristic and Bremsstrahlung X-Rays Using Monte Carlo X-ray Depth Distributions Applied to Bulk and Multilayer Materials [J] . Yuan Yu, Demers Hendrix, Rudinsky Samantha, Microscopy and microanalysis: The official journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada . 2019,第1期

机译：使用Monte Carlo X射线深度分布的特性和Bremsstrahlung X射线的二次荧光校正施加到散装和多层材料
2. Monte Carlo simulation of NbK alpha secondary fluorescence in EPMA: comparison of PENELOPE simulations with experimental results [J] . Fournelle JH, Kim S, Perepezko JH Surface and Interface Analysis: SIA: An International Journal Devoted to the Development and Application of Techniques for the Analysis of Surfaces, Interfaces and Thin Films . 2005,第11期

机译：EPMA中NbKα二次荧光的蒙特卡洛模拟：PENELOPE模拟与实验结果的比较
3. Correction of Secondary Fluorescence Across Phase Boundaries in Electron Probe Microanalysis of Mineral Inclusions [J] . Llovet Xavier, Proenza Joaquin A., Pujol-Sola Nuria, Microscopy and microanalysis: The official journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada . 2020,第5期

机译：矿质探针微分析矿质概率跨相荧光的校正
4. Numerical correction for secondary fluorescence across phase boundaries in EPMA [C] . J A Escuder, F Salvat, X Llovet, European workshop of the European Microbeam Analysis Society (EMAS) on modern developments and applications in microbeam analysis . 2010

机译：EPMA中跨越相边界次级荧光的数值校正
5. Structural characteristics of metal oxide thin films grown by pulsed laser deposition [and] fluorescence excitation spectroscopy of amino radical, fluoromethylene, and chlorocarbene under jet-cooled condition and measurement of fluorescence lifetime. [D] . Fan, Haiyan. 2004

机译：在脉冲冷却条件下通过脉冲激光沉积[和]自由基，氟代亚甲基和氯卡宾的荧光激发光谱和原子荧光测量方法生长的金属氧化物薄膜的结构特征，以及荧光寿命的测量。
6. Autofluorescence Characteristics of Normal Foveas and Reconstruction of Foveal Autofluorescence from Limited Data Subsets [O] . R. Theodore Smith, Jan P. Koniarek, Jackie Chan, -1

机译：正常中央凹的自发荧光特征和有限数据子集对中央凹自发荧光的重建
7. The secondary characteristic fluorescence correction in the EPMA [O] . Anderson, I. M., Bentley, J., Carter, C. B. 1995

机译：Epma中的二次特征荧光校正
8. Secondary characteristic fluorescence correction in the EPMA [R] . Anderson, I. M., Bentley, J., Carter, C. B. 1995

机译：Epma中的二次特征荧光校正

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