Maglev six degree-of-freedom fine position stage control system

摘要

A wafer positioning system was recently developed by Sandia National Laboratories for an Extreme Ultraviolet Lithography (EUVL). The system, which utilizes a magnetically levitated fine stage to provide ultra-precise positioning in all six degrees of freedom, incorporates technological improvements resulting from four years of prototype development experience. System enhancements, implemented on a second generation design for a National Center for Advanced Information Component Manufacturing (NCAICM) Structural Control Testbed, define the present level of research. This paper describes the design, implementation, and functional capability of the systems. Specifics regarding control system electronics, including software and control algorithm structure, as well as performance design goals and test results are presented.