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Annual Technical Progress Report IV 'In-Situ 'Electron Microscope Investigation of the Nucleation and Growth of Sputtered Thin Films

机译:年度技术进步报告IV“原位”电子显微镜研究溅射薄膜的成核和生长

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Procedures have been devised which allow mica and graphite substrates with numerous thin areas (a few hundred angstroms thick) to be prepared onto which reproducible deposits can be formed. The dependence of the number density of observable islands in the early growth stage upon substrate temperature and deposition rate have been determined. The third area of activity in the past year has been the procurement and testing of additional vacuum equipment to ultimately allow deposition studies to be performed inside the electron microscope in improved vacuum conditions.

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