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DEPOSITION OF UNIFORM ALUMINUM FILMS ON KAPTON LAMINATES BY ELECTRON BEAM EVAPORATION

机译:用电子束蒸发法在KapTON层压板上沉积均匀的铝膜

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摘要

Aluminum films 10 µm thick with a thickness uniformity in the one percent range have been obtained on the Kapton surface of a laminated substrate consisting of Kapton/Kapton/aluminum foil bonded with a thermosetting adhesive. The processing of the substrates before deposition necessary to obtain reasonable deposition cycle times and a minimal amount of deposition system contamination was developed. The laminated substrates required bakeouts both at atmosphere and in high vacuum prior to deposition to permit evaporation at a pressure of 0.1 mPa (1 X 10-6 torr). The deposited films exhibited a high specular reflectance and were thus mirror-like in appearance. Film resistivity was within 10 percent of that of bulk aluminum, and the films displayed a strong (III) fiber texture.

著录项

  • 作者

    Dudley M. Sherman;

  • 作者单位
  • 年度 1978
  • 页码 1-19
  • 总页数 19
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工业技术;
  • 关键词

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