Comparison of Ion Milling Techniques for Cross-Sectional TEM of Semiconductors

摘要

The use of cross-sectional Transmission Electron Microscopy (TEM) has become invaluable for the characterization of the near-surface regions of semiconductors following ion-implantation and/or transient thermal processing. A fast and reliable technique is required with produces a large thin region while preserving the original sample surface. New analytical techniques, particularly the direct imaging of dopant distributions, also require good thickness uniformity. Two methods of ion milling are commonly used, and are compared. The older method involves milling with a single gun from each side in turn, whereas a newer method uses two guns to mill from both sides simultaneously. (ERA citation 10:046799)