In-Situ Oxygen-Atom Erosion Study of a Polyhedral Oligomeric Silsesquioxane (POSS)-Siloxane Copolymer Using a Novel Hyperthermal Oxygen Atom Source and Analysis by X-Ray Photoelectron Spectroscopy.

摘要

The surface of a film of a polyhedral oligomeric silsesquioxane (POSS)-siloxane copolymer has been characterized in-situ using X-ray photoelectron spectroscopy (XPS) before and after exposure to incremental fluences of oxygen atoms produced by a novel hyperthermal oxygen atom source. The data indicate that the atomic oxygen initially attacks the cyclohexyl groups that surround the POSS cage resulting in the formation and desorption of CO(2) from the surface.