UV-Assisted Reduction in BBL/Graphene Nanocomposite for Micropatterning.

摘要

Recent extensive interest in graphene associated with its unusual properties has motivated the development of new composite materials for nanoelectronics, supercapacitors, batteries, photovoltaics, and related devices. The conjugated ladder polymer poly(benzimidazoben zophenanthroline) (BBL) has received interest as a conductive and nonlinear optical material due to its extensive -electron delocalization, coupled with high mechanical strength, thermal stability, and good solution processability. This project involved fabrication, processing, and characterization of BBL/graphene nanocomposites and examination of film electrical properties. Composite films composed of various concentrations of BBL and graphene oxide (GO) were reduced to patterned electrically conductive films using ultraviolet light (UV). Removal the oxygen-containing functionality of the GO was confirmed by X-ray and Raman photoelectron spectroscopies, and scanning electron microscopy. Sheet resistance decreased from 1011 to 106 after 2 h of UV irradiation. This report provides details behind composite film processing and patterning, GO reduction, and sample characterization.