Dense, Nonaqueous-Phase Liquid of DNAPL Source Zone at Launch Complex 34 in Cape Canaveral Air Force Station, Florida

摘要

Dense, nonaqueous-phase liquid contaminants are a challenge to characterize and remediate at many sites where such contaminants have entered the aquifer due to past use of disposal practices. Chlorinated solvents are common DNPL contaminates at sites where operations, such as aircraft maintenance, dry cleaning, and metal finishing have historically occurred. In the past, because of the difficulty in identifying the DNAPL source zone, most remediation efforts focused on controlling the migration of the dissolved chlorinated volatile organic compounds plume. Recently, many sites owners have had success in locating DNAPL sources. DNAPL source remediation is beneficial because once the source has been significantly mitigated; the strength and duration of the resulting plume can potentially be lowered. The goal of the project is to evaluate the technical and cost performance of the resistive heating technology for remediation of DNAPL source zones. Resistive heating technology splits conventional three-phase electricity into six electrical phases and delivers it to the subsurface through metal electrodes. In the subsurface, the electrical energy resistively heats the soil and groundwater to generate steam. A combination of direct volatilization and steam stripping drives contaminants to the vadose cone, where a vapor extraction steam collects the steam and contaminant vapors and treats them in an above ground treatment system. The resistive heating demonstration is part of a larger demonstration of three different DNAPL remediation technologies being conducted.