Very Large Scale Integration of Nano-Patterned YBa2Cu3O7-delta Josephson Junctions in a Two-Dimensional Array

摘要

Very large scale integration of Josephson junctions in a two- dimensional series-parallel array has been achieved by ion irradiating a YBa2Cu3O(7-delta) film through slits in a nano-fabricated mask created with electron beam lithography and reactive ion etching. The mask consisted of 15, 820 high-aspect ratio (20:1), 35-nanometer wide slits that restricted the irradiation in the film below to form Josephson junctions. Characterizing each parallel segment k, containing 28 junctions, with a single critical current I(sub ck) we found a standard deviation in I(sub ck) of about 16%.