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Very Large Scale Integration of Nanopatterned YBa2Cu3O7-delta Josephson Junctions in a Two-Dimensional Array

机译:二维阵列中纳米图案化的YBa2Cu3O7-δJosephson结的超大规模集成

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摘要

Very large scale integration of Josephson functions in a two-dimensional series-parallel array has been achieved by Ion irradiating a YBa(2)cu(3)O(7-delta) film through slits in a nanofabricated mask created with electron beam lithography and reactive ion etching. The mask consisted of 15820 high aspect ratio (20:1), 36 nm wide slits that restricted the irradiation in the film below to form Josephson Junctions. Characterizing each parallel segment k, containing 28 junctions, with a single critical current I-ck we found a standard deviation in I-ck Of about 16%.
机译:约瑟夫森函数在二维串联-平行阵列中的超大规模集成已通过离子辐照YBa(2)cu(3)O(7-delta)膜通过电子制造与电子束光刻技术形成的纳米掩模中的缝隙实现,并且反应离子蚀刻。掩模由15820高纵横比(20:1)和36 nm宽的狭缝组成,这些狭缝限制了下面薄膜的辐照,从而形成了约瑟夫森结。用单个临界电流I-ck表征包含28个结的每个并行段k,我们发现I-ck的标准偏差约为16%。

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