首页> 美国政府科技报告 >Smart 45nm Foundry CMOS with Mask-Lite (trademark) Reduced Mask Costs.
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Smart 45nm Foundry CMOS with Mask-Lite (trademark) Reduced Mask Costs.

机译:具有mask-Lite(商标)的智能45nm铸造CmOs降低了掩模成本。

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摘要

American Semiconductor has created Mask-Lite which is a layout and fabrication strategy that reduces mask costs and improves access to advanced 45nm bulk CMOS from their ITAR registered and TRUSTED ready on-shore commercial foundry.

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