Interaction of Microwave Radiation with a Non-Uniform Plasma Sheath Adjacent to a Conducting Wall

摘要

The interaction of microwave radiation with a non-uniform plasma sheath terminated by a conducting wall has been obtained both by numerical solution and by the WKB method. Two electron density profiles, one of exponen tial form and the other parabolic, were chosen for the investigation. For the exponential profile the reflection coefficient decreases from unity at low electron densities to an asymptotic value at high electron densities; this limiting value is identical with the corresponding result for the infinite plasma. For the parabolic profile, however, as the electron density increases the refeflection coefficient decreases from unity to a minimum and then increases to unity as the electron density becomes large. The results show, in addition, that the distribution of absorbed flux is much more markedly affected by an increase in maximum electron density for the case of the parabolic profile than it is for the exponential case.