首页> 外国专利> Microwave excited plasma reactor - uses cylindrical quartz-walled plasma deposition chamber with conducting exterior having windows for waveguide connections from generator

Microwave excited plasma reactor - uses cylindrical quartz-walled plasma deposition chamber with conducting exterior having windows for waveguide connections from generator

机译:微波激发等离子体反应器-使用圆柱形石英壁等离子体沉积室,其传导外部具有窗口,用于与发生器的波导连接

摘要

The plasma reactor supplies (5,6) gas, such as argon or hydrogen, centrally to a sealed chamber, typically 400mm high, 150mm dia., having a 10mm thick quartz wall (2), metallised or copper-sheeted externally (7). A rectangular waveguide (4) connects the 600W 2.45GHz generator (3) to a window (8) in the conducting exterior, at cylinder mid-height, dimensioned to match the waveguide end (9) and complete the conducting enclosure. Propagation occurs in the quartz dielectric, in the same mode as in the guide, with plasma in contact with the interior surface. To ensure the whole interior is plasma-filled, sections of the interior wall may be metallised and/or additional peripheral excitation points may be provided. The substrate to be treated is supported inside. USE/ADVANTAGE - For plasma deposition on ceramic substrate. Interior is unencumbered by e.g. antennae, maximising useful volume.
机译:等离子体反应器从中央向密封腔室供应(5,6)气体,例如氩气或氢气,该密封腔室通常为400毫米高,直径为150毫米,具有10毫米厚的石英壁(2),外部经金属化或镀铜(7) 。矩形波导(4)将600W 2.45GHz发生器(3)连接到位于圆柱体中间高度的导电外部的窗口(8),窗口的尺寸与波导端(9)匹配,从而完成了导电外壳。石英电介质中的传播方式与引导方式相同,等离子体与内表面接触。为了确保整个内部充满等离子体,可以对内壁的部分进行金属化处理和/或提供其他外围激励点。待处理的基板支撑在内部。使用/优点-用于在陶瓷基板上进行等离子体沉积。内部不受例如天线,最大程度地增加了使用空间。

著录项

  • 公开/公告号FR2694474A1

    专利类型

  • 公开/公告日1994-02-04

    原文格式PDF

  • 申请/专利权人 ONERA;

    申请/专利号FR19920009376

  • 发明设计人 BERNARD JACQUES;

    申请日1992-07-29

  • 分类号H05H1/46;

  • 国家 FR

  • 入库时间 2022-08-22 04:33:47

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