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Microwaves - energized plasma processing apparatus using a of a toothed waveguide - plasma reactors excited linear micro shafts plasma source
Microwaves - energized plasma processing apparatus using a of a toothed waveguide - plasma reactors excited linear micro shafts plasma source
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机译:使用齿波导的微波激励等离子体处理装置-等离子体反应堆激发的线性微轴等离子体源
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摘要
The present invention relates to a microwave - energized plasma processing apparatus using a of a toothed (ridged) waveguide - plasma reactors excited linear micro shafts plasma source. The microwaves - excited or energized plasma processing apparatus (200) comprises a processing cavity (210), a toothed waveguide (220) and a partition board (230). The toothed waveguide (220) is connected to the processing of cavity (210) and comprises a frame (222), a back portion (224) and a linear channel (226), wherein the linear channel (226) on the first side of the frame (222) is located and the back portion (224) is at the second side of the frame (222), and in particular the linear channel (226) is located opposite. The separating board (230) is attached to the linear channel (226) is arranged. In addition, the toothed waveguide (220) for receipt of a microwave by the linear channel (226) for exciting a plasma for processing cavity (210) is transmitted.
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