首页> 外国专利> Microwaves - energized plasma processing apparatus using a of a toothed waveguide - plasma reactors excited linear micro shafts plasma source

Microwaves - energized plasma processing apparatus using a of a toothed waveguide - plasma reactors excited linear micro shafts plasma source

机译:使用齿波导的微波激励等离子体处理装置-等离子体反应堆激发的线性微轴等离子体源

摘要

The present invention relates to a microwave - energized plasma processing apparatus using a of a toothed (ridged) waveguide - plasma reactors excited linear micro shafts plasma source. The microwaves - excited or energized plasma processing apparatus (200) comprises a processing cavity (210), a toothed waveguide (220) and a partition board (230). The toothed waveguide (220) is connected to the processing of cavity (210) and comprises a frame (222), a back portion (224) and a linear channel (226), wherein the linear channel (226) on the first side of the frame (222) is located and the back portion (224) is at the second side of the frame (222), and in particular the linear channel (226) is located opposite. The separating board (230) is attached to the linear channel (226) is arranged. In addition, the toothed waveguide (220) for receipt of a microwave by the linear channel (226) for exciting a plasma for processing cavity (210) is transmitted.
机译:微波激励的等离子体处理设备技术领域本发明涉及一种微波处理的等离子体处理设备,其使用带齿的(脊形的)波导-等离子体反应器激发线性微轴等离子体源。微波激发或激发的等离子体处理设备(200)包括处理腔(210),带齿的波导(220)和隔板(230)。齿形波导(220)连接到腔体(210)的处理,并且包括框架(222),背部(224)和线性通道(226),其中线性通道(226)位于腔体的第一侧。框架(222)位于并且后部(224)在框架(222)的第二侧,并且特别地,线性通道(226)位于相对的位置。分隔板(230)附接到布置的线性通道(226)。另外,传输用于通过线性通道(226)接收微波的带齿波导(220),所述线性通道用于激发用于处理腔(210)的等离子体。

著录项

  • 公开/公告号DE102008001514A1

    专利类型

  • 公开/公告日2009-07-02

    原文格式PDF

  • 申请/专利权人

    申请/专利号DE20081001514

  • 发明设计人

    申请日2008-04-30

  • 分类号H05H1/46;

  • 国家 DE

  • 入库时间 2022-08-21 19:09:21

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