Design and Construction of a Bakeable Sputtering Apparatus

摘要

The construction and testing of an apparatus for studying sputtering is described. The apparatus consists of a duoplasmatron ion source, analyzing magnet, deceleration system, and target chamber. Temperature cycling of the entire system to 400C can be tolerated. The operations of the ion source, analyzing magnet, and deceleration system are described individually and as a system. A target holder bakeable to 400C with two degrees of rotational freedom is described. A short feasibility study is included of an ultra violet ionization source capable of ionizing sputtered atoms. (Author)