Tantalum Alloy Chemical Vapor Plating of Gun Barrels.

摘要

A CVD technique for alloy deposition on gun barrels was successfully demonstrated and explored. The specific system employed the generation of mixed tantalum tungsten chloride species from a single generator containing Ta-10W alloy chips reacted with flowing chlorine gas. This mixture was then mixed with hydrogen and the total mixture passed through a heated gun barrel where deposition took place. The barrel materials used were Vascojet MA and Inconel 718. Formation of a more uniform, finer, grain structure with a lower microhardness than previously reported for CVD deposition was achieved. Reasonably good uniformity was achieved with regard to composition over the full length of the particular barrel geometry. Typical variations in tungsten composition were between 8% and 12% by weight. Problem areas encountered were deposition thickness, end effects, and non-concentricity. Subsequent studies to eliminate the problems encountered and effect a suitable technique for Ta-10W alloy deposition on gun barrel bores are recommended.