Depositing Optical Films of Controlled Composition

摘要

This invention relates to an improvement in the apparatus used for RF sputtering of target materials onto substrates. The invention addresses the structural alterations necessary to simultaneously sputter multiple material types onto a single substrate with the ability to alter the composition of the deposited materials on a continuous basis. As taught and claimed herein a movable, grounded shield is interposed between the target and substrate in close proximity to the target. An aperture in the shield confines the sputtering plasma and deposits it on the face of the target. When the target is composed of multiple materials which are divided into adjacent segments, the selective location of the aperture and plasma defines the relative contributions of target materials transferred to the substrate. Temporal movement of the shield translates into corresponding variations of composition at various levels in the deposition. (Author)