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UV-Preionized KrF Excimer Laser with an Output Energy of 0.42 J

机译：紫外预电离KrF准分子激光器，输出能量为0.42 J

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No abstract available.

著录项

作者
Yuan, C.; Cheng, S.; Ye, C.; Dou, A.; Lin, Y.;
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年度 1982
页码 p.1-12
总页数 12
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Lasers; Excimers; Krypton; Fluorides; Ultraviolet radiation; Ionization;

机译：激光; Excimers;氪;氟化物;紫外线辐射;电离;

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专利

1. Effective energy densities in KrF excimer laser reformation as a sidewall smoothing technique [J] . Eih-Zhe Liang, Shin-Che Hung, Ya-Ping Hsieh, Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures . 2008,第1期

机译：作为侧壁平滑技术的KrF准分子激光重整中的有效能量密度
2. Ultrashallow p~+ Junction Prepared by Low Energy BF_3 Plasma Doping and KrF Excimer Laser Annealing [J] . D. Lee, S. Baek, S. Heo Electrochemical and solid-state letters . 2006,第1期

机译：低能BF_3等离子体掺杂和KrF受激准分子激光退火制备的超浅p〜+ / n结
3. A six-beam high-power KrF excimer laser system with energy of 100 J/23 ns [J] . Shan YS., Wang NY., Ma JL., Laser and Particle Beams . 2002,第1期

机译：能量为100 J / 23 ns的六光束大功率KrF准分子激光系统
4. Energy-dispersive mass spectrometry of high energy ions generated during KrF excimer and frequency-doubled Nd:YAG laser ablation of metals [C] . Glenn C.Tyrrell, Luigi G.Coccia, Tim H.York, Symposium F: international conference on laser ablation . 1996

机译：KRF准分子和频率加倍的高能量离子的能量分散质谱：金属的YAG激光烧蚀
5. Design of Plasmonic-Semiconductor Nano-Resonator Lasers, Geometrical Energy Velocity, and Laser Output-Coupler Optimization [D] . Chen, Xi 2014

机译：等离子体半导体纳米谐振器激光器的设计，几何能速和激光输出耦合器的优化
6. Preparation of periodic surface structures on doped poly(methyl metacrylate) films by irradiation with KrF excimer laser [O] . Yevgeniya Kalachyova, Oleksiy Lyutakov, Petr Slepicka, 2014

机译：用KrF准分子激光辐照在掺杂的聚甲基丙烯酸甲酯薄膜上制备周期性表面结构
7. Discharge-Current Characteristics in UV-Preionized Kr/He, F₂/He Gas-Mixtures and KrF Excimer Laser Gas [O] . Nobuyuki Nakagawa, Hitoshi Kawakami, Ken Yukimura 1992

机译：UV-PRIOPIED KR / HE中的放电电流特性，F _{2 / HE气体混合物和KRF准分子激光气体}

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