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Silicon Nitride Stencil Masks for High Resolution Ion Lithography Proximity Printing

机译：用于高分辨率离子光刻接近印刷的氮化硅模板掩模

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作者
Randall, J. N.; Flanders, D. C.; Economou, N. P.; Donnelly, J. P.; Bromley, E. I.;
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年度 1983
页码 p.1-5
总页数 5
原文格式 PDF
正文语种 eng
中图分类工业技术 ;
关键词
Lithography; Masks; Silicon nitrides; Ion beams; Polymethyl methacrylate; Ions; Etching; Fabrication; Hydrogen; Fluorinated hydrocarbons; Reprints;

机译：光刻;掩模;氮化硅;离子束;聚甲基丙烯酸甲酯;离子;蚀刻;制造;氢;氟化烃;重印;

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专利

1. Approach to full-chip simulation and correction of stencil mask distortion for proximity electron lithography [J] . J. Sawamura, K. Suzuki, S. Omori, Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures . 2004 ,第6期

机译：邻近电子光刻的全芯片仿真和模板掩模畸变校正方法
2. Optimization of Low-Energy Electron Beam Proximity Lithography Stencil Mask Structure Factors by Monte Carlo Simulation [J] . Chiho KIM, In-Yong KANG, Yong-Chae CHUNG Japanese Journal of Applied Physics. Part 1, Regular Papers & Short Notes . 2004 ,第3期

机译：基于Monte Carlo模拟的低能电子束光刻模板掩模结构因子优化。
3. Thermal emissivity of carbon coated p-doped silicon stencil masks for ion projection lithography [J] . D. Braun, R. Gajic, F. Kuchar, Journal of Vacuum Science & Technology. B, Microelectronics Processing and Phenomena . 2003 ,第1期

机译：碳涂覆的p掺杂硅模板掩模的热发射率，用于离子投影光刻
4. Proximity Effect Correction By Pattern Modified Stencil Mask In Large Field Projection Electron-Beam Lithography [C] . Kobinata, H., Yamashita, . 1998

机译：大面积投影电子束光刻中通过图案修饰的模板掩模校正邻近效应
5. Mechanically adjustable single-molecule transistors and stencil mask nanofabrication of high-resolution scanning probes. [D] . Champagne, Alexandre. 2005

机译：机械可调的单分子晶体管和高分辨率扫描探针的模板掩膜纳米加工。
6. High-Resolution High-Throughput Positive-Tone Patterning of Poly(ethylene glycol) by Helium Beam Exposure through Stencil Masks [O] . Eliedonna E. Cacao, Azeem Nasrullah, Tim Sherlock, -1

机译：通过模板掩膜曝光氦气对聚乙二醇进行高分辨率高通量正色调成像
7. Experimental characterization and physical modeling of resolution limits in proximity printing x-ray lithography [O] . 1991

机译：近距离打印X射线光刻中的分辨率极限的实验表征和物理建模
8. Silicon Nitride Stencil Masks for High Resolution Ion Lithography Proximity Printing. [R] . Randall, J. N., Flanders, D. C., Economou, N. P., 1983

机译：用于高分辨率离子光刻接近印刷的氮化硅模板掩模。

Silicon Nitride Stencil Masks for High Resolution Ion Lithography Proximity Printing

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