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Patterned Photonucleation of Chemical Vapor Deposition Al by UV-Laser Photodeposition

机译：紫外激光光沉积法制备化学气相沉积al的光子化

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作者
Tsao, J. Y.; Ehrlich, D. J.;
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年度 1984
页码 p.1-4
总页数 4
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Vapor deposition; Photochemical reactions; Nucleation; Aluminum; Ultraviolet lasers; Thin films; Surfaces; Pyrolysis; Butyl radicals; Infrared lasers; Catalysis; Heterogeneity; Carbon dioxide lasers; Substrates; Quartz; Reprints;

机译：气相沉积;光化学反应;成核;铝;紫外激光;薄膜;表面;热解;丁基;红外激光;催化;异质性;二氧化碳激光;基板;石英;重印;

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3. Fabrication of patterned graphitized carbon wires using low voltage near-field electrospinning,pyrolysis, electrodeposition, and chemical vapor deposition [J] . Derosh George, Chong Liu, Roger C.Lo, 微系统与纳米工程（英文） . 2020,第001期

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4. Pattern Dependency of Pure-Boron-Layer Chemical-Vapor Depositions [C] . V. Mohammadi, W.B. de Boer, T.L.M. Scholtes, Silicon compatible materials, processes, and technologies for advanced integrated circuits and emerging applications 2. . 2012

机译：纯硼层化学气相沉积的模式依赖性
5. Growth of carbon nanotubes on patterned silicon wafer by thermal chemical vapor deposition (CVD). [D] . Wang, Chiu-Hui. 2005

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Patterned Photonucleation of Chemical Vapor Deposition Al by UV-Laser Photodeposition

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