Limited Reaction Processing for Semiconductor Device Fabrication

摘要

A new class of semiconductor processing equipment is shown to be feasible. Test equipment has been designed and fabricated which uses a combination of Rapid Thermal and Chemical Vapor Deposition (CVD) technologies to achieve epitaxial growth and deposition of semiconductors and insulators. The trend towards single wafer processing makes Limited Reaction Processing (LRP) particularly relevant to state of the art device fabrication research.