Wavelength Independent Optical Lithography and Microscopy at 500A Resolution

摘要

During the past years we have established the field of subwavelength optics by developing nearfield technology with the equipment from this grant and coupling that with microfabrication technology. In a proposal to be submitted in 1987, we plan to use this equipment to greatly extend our capabilities in subwavelength light beam technology by a simple conversion of our nearfield scanning optical microscope into a direct write laser beam writing tool. This new tool should have a substantial impact since it would afford direct write optical pattern fabrication at 50nm feature size. In addition, certain modifications to the instrumentation from this grant will allow us to put together a 50nm resolution optical metrology tool.