Laser-Driven Chemical Vapor Deposition of Platinum at Atmospheric Pressure and Room Temperature from CpPt(CH3)3

摘要

Thin films and patterned microstructures of platinum are of interest for applications to microelectronics because the metal has low resistivity and high stability. Thermal deposition of platinum from the vapor phase has been successful using Pt(acetylacetonate)2, Pt(PF3)4, and Pt(CO)2Cl2. The air-stable organometallic platinum compound CpPt(Me)3 has a high vapor pressure (0.052 Torr at 20 C) and has recently been reported to yield high quality thermally deposited films at 250 C and .0001 Torr. Photolysis of (Cp) Pt(Me)3 (Cp = eta 5-C5H5, Me = CH3) at room temperature and atmospheric pressure produces thin films and patterned structures of platinum metal on solid substrates. The platinum films are characterized by Auger electron spectroscopy, x-ray diffraction, and scanning electron microscopy. Substrates can also be prepatterned by laser irradiation and then developed into a shiny platinum deposit at later time. Keywords: Methyl radicals, Reprints. (aw)