首页> 美国政府科技报告 >Measurement of Reflection High-Energy Electron Diffraction Oscillations duringMolecular-Beam Epitaxial Growth of GaAs on a Rotating Substrate. (Reannouncement with New Availability Information)
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Measurement of Reflection High-Energy Electron Diffraction Oscillations duringMolecular-Beam Epitaxial Growth of GaAs on a Rotating Substrate. (Reannouncement with New Availability Information)

机译:旋转衬底上Gaas分子束外延生长过程中反射高能电子衍射振荡的测量。 (重新公布新的可用性信息)

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摘要

A technique has been developed for the measurement and analysis of reflectionhigh-energy electron diffraction (RHEED) oscillations occurring during molecular-beam epitaxy on a rotating substrate. Previously, it has been necessary to stop substrate rotation in order to perform oscillation analysis. This limitation has been overcome by combining a computerized video tracking system with a previously reported technique for frequency-domain analysis.... Molecular-beam epitaxy, Epitaxy, RHEED analysis.

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