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Trap Characterization in High Field, High Temperature Stressed Gallium Nitride High Electron Mobility Transistors.

机译:高场,高温应力氮化镓高电子迁移率晶体管的陷阱表征。

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摘要

Gallium Nitride (GaN) high electron mobility transistors (HEMTs) offer higher power output over existing technology. However, issues such as current collapse and kink effect hinder GaN HEMTs performance. The degraded performance is linked to traps within

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