Nanofabrication of Electronic Devices with the Scanning Tunneling Microscope

摘要

This grant represents one year of funding plus a one-year, no-cost extension. Themain achievements were: (1) Development of a new technique for imaging rapidly with the STM. (2) The reproducibility of the writing process was improved dramatically. (3) Commercial STM electronics were adapted to our STM. (4) Fabrication of the smallest continuous metallic lines to date: 24 nm wide. (5) Design and construction of a compact STM for nanofabrication. These main points are described briefly below and in more detail in the publications listed at the end. Other groups have followed our lead in using the STM to break down precursor gases to make nanoscale deposits, namely Matsui's group at NBC in Tsukuba, Japan, Kent's group at IBM Yorktown (now at New York University), Behm's group in Munchen, Germany, and Nayfeh's group at U. Illinois. This technique is therefore likely to become more important over the next decade. jg p.2.