Fourier Synthesis Lithographic Machine for Large Panel Display Fabrication

摘要

This report addresses the development of a substitute for conventionallithographic technologies used to fabricate flat panel displays. Conventional technology has several weaknesses: an image field <50 mm x 50 mm, a need for expensive projection equipment and precision stepper machines with a positioning accuracy of -0.25 microns and depth of focus of -1 micron; and the necessity to use complicated mask technologies which pollute the environment. Physical Optics Corporation (POC) is developing a new Fourier synthesis lithography technology which will provide a field size of 500 mm x 500 mm without optical distortion or aberration. During Phase I, POC completed an optimization procedure to find the exact harmonic exposure to create the highest edge gradient in a synthetic lithographic pattern. We produced a comprehensive computer model of photoresist multiple exposure, and confirmed it experimentally. We also experimentally confirmed our simulation of the lateral propagation of the development process in photoresist. We completely designed the proposed Fourier synthesis lithographic machine (FSLM). We anticipate that development of this new technology will lead to the construction of a full scale FSLM. (MM).